Previously under Orbotech that KLA acquired in 2019.

SPTS Technologies provides advanced wafer processing solutions to the world's leading semiconductor and microelectronic device manufacturers. We make electronics possible.

Omega fxP is a cluster system supporting up to 6 plasma etch (ICP, DRIE, and/or Synapse) chambers. The fxP is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability and productivity.

KLA / SPTS

OMEGA fxP

The Omega Etch Systems from SPTS offers advanced etch technologies for a wide range of applications within Advanced Packaging, MEMS, Photonics, Power Devices, and RF-IC.

OMEGA 201

Omega Synapse etch process module uses a high density plasma source and is designed to etch strongly bonded materials.

OMEGA SYNAPSE

The Monarch25 is a 25-wafer batch process module designed for medium to high volume HF release etch production applications in either the Primaxx® fxP or Primaxx® c2L configurations.
High throughput, high uptime 25-wafer batch processing
Process chamber, gas/liquid panel, and pressure/vacuum components, all within a small footprint
Extensive process control and monitoring functions ensure the yield, reliability and repeatability required in volume production

PRIMAXX MONARCH 25

MPX ICP PRO

Pegasus Rapier

SPTS ICP process module is highly flexible and etches a wide range of materials including oxides, nitrides, polymers, low aspect ratio Si and metals. The Omega ICP process module uses a patented high density plasma source incorporating a radial coil design. The  The ICP module is the industry leader for compound semiconductor applications.

Typical materials:

GaAs
GaN
SixNy
BCB and Polyimide

OMEGA ICP

The accelerated etch rates and superior components make the Xactix X4 ideal for intensive R&D and pilot production. It is the leading XeF2 etch system for releasing MEMS devices.  

XACTIC X4

MPX ICP

Xactix fxP - a cluster system supporting up to 6 CVE XeF2 etch chambers.
The fxP is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability and productivity.

XACTIX fxP

The Primaxx® Monarch300 is a fully integrated, automated VHF etch tool designed to perform selective MEMS etch release via a controlled anhydrous HF/Alcohol etch process. The process provides a vapor phase, isotropic etch of sacrificial oxide to release a flexure or other device. No liquids are used in contact with these MEMS devices and therefore “stiction” creating conditions are avoided. A clean, residue-free release etch is accomplished without liquids or supercritical drying.
Compatible with 200mm & 300mm wafers
High throughput, high uptime 13-wafer batch processing
Process chamber, gas/liquid panel, and pressure/vacuum components, all within a small footprint



PRIMAXX MONARCH 300

The SPTS Omega Rapier is a deep silicon etcher that uses an inductively coupled plasma (ICP) etching system for etching deep features in silicon. It uses a fast switching Bosch process that produces smooth sidewall profiles while etching silicon up to 30 µm per minute. The Rapier module etches Si using Bosch switched processing as well as non-switched etching for tapered profiles, wafer thinning and via reveal.

OMEGA RAPIER

SPTS's uEtch is a single-wafer system specifically designed for university and small research laboratories.
  Can process single whole wafers (100-200mm) or die on a carrier
  HF vapor processes are transferable to SPTS 3- and 25-wafer production systems, offering a path from concept to production

PRIMAXX uETCH

Primaxx fxP - a cluster system supporting up to 6 Monarch 25 or Monarch 300 vapor HF etch chambers.
The fxP is an 8-sided cluster system supporting up to 6 process modules for the ultimate in throughput, availability and productivity.

PRIMAXX fxP

XACTIX e1

OMEGA RAPIER DSI

The Monarch 3 is a compact module includes a 3-wafer process chamber, and is designed for research laboratory and small volume production environments.
Third generation process chamber has been designed for easy wafer size changes and maintenance
Wafer loading options include a semi-automatic 3-wafer loader with load lock, and various cluster-based configurations

PRIMAXX MONARCH 3

The Xactix e2 is an ideal solution for those seeking a low cost, table-top R&D xenon difluoride etching system.

Key to successful research is process flexibility and the Xactix e2 provides the widest range of process options. Developed as the successor to the e1, the e2 retains ease of use, low cost of ownership and a small footprint, but adds additional options and even greater process flexibility.  



XACTIX e2

The CVE module is compatible with SPTS' cluster platforms, and has a unique chamber design which provides high etch rates, uniformity and efficiency. It is designed allow high volume production and the integration of  XeF2 modules with the other process modules available from SPTS.

XACTIX CVE

DSi-v module offers higher etch rates and low nonuniformity for non-critical or high load cavity etching, and blanket
silicon etching for via reveal or thinning.

KLA / SPTS

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Top KLA / SPTS Dry / Plasma Etch

OMEGA 201

OMEGA fxP

PRIMAXX MONARCH 25

OMEGA SYNAPSE

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All KLA / SPTS Dry / Plasma Etch