Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing

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EGV-30GX

For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor

NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm
(4"" Deep Pocket )

The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.

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NuFlare EGV-30GX 6"Susceptor(Covalent Material)φ740mm

The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.

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For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor

NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm

The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.

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EGV-30GX

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EGV-30GX

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EGV-30GX

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EGV-30GX

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