Description
Description Dimension Qty MAIN BLOCK w/ CS 63 87 100 1 INTERFACE MODULE 63 27 98 1 SHINWA TEMPERATURE & HUMIDITY CONTROL UNIT 57 26 68 1 SMC THERMOCON UNIT 44 18 56 1 CHEMICAL CABINET 87 44 83 1 AC TRANSFORMER BOX 30 28 74 1 COVER PANELS & FILTER UNIT(2EA),THC DUCT. 67 44 42 1Configuration
OEM : TEL MODEL : ACT-8 PROCESS BLOCK : 1 COATER, 2 DEVELOPER BLOCK TYPE : SINGLE WAFER FLOW : LEFT to RIGHT CSB / Cassette station block -OPEN UNI-CASSETTE/NON SMIF PSB / Process station block 2-1 : COT -2 Coat nozzle -2 Back rinse nozzle -EBR 2-3 : DEV -LD Nozzle -2 Rinse nozzle 2-4 : DEV -LD Nozzle -2 Rinse nozzle IFB / Interface station block -Interface for NIKON Stepper TEMPERATURE AND HUMIDITY CONTROLLER -T&H-ESA-4-D-05 / SHINWHA 1 unit THERMO CONTROLLER -INR-244-265A-2400 / SMC 1 unit CHEMICAL SUPPLY CABINET -1 unit AC Power boxOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
Verified
CATEGORY
Coaters & Developers
Last Verified: 9 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
127836
Wafer Sizes:
8"/200mm
Vintage:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ACT 8
CATEGORY
Coaters & Developers
Last Verified: 9 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
127836
Wafer Sizes:
8"/200mm
Vintage:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Description Dimension Qty MAIN BLOCK w/ CS 63 87 100 1 INTERFACE MODULE 63 27 98 1 SHINWA TEMPERATURE & HUMIDITY CONTROL UNIT 57 26 68 1 SMC THERMOCON UNIT 44 18 56 1 CHEMICAL CABINET 87 44 83 1 AC TRANSFORMER BOX 30 28 74 1 COVER PANELS & FILTER UNIT(2EA),THC DUCT. 67 44 42 1Configuration
OEM : TEL MODEL : ACT-8 PROCESS BLOCK : 1 COATER, 2 DEVELOPER BLOCK TYPE : SINGLE WAFER FLOW : LEFT to RIGHT CSB / Cassette station block -OPEN UNI-CASSETTE/NON SMIF PSB / Process station block 2-1 : COT -2 Coat nozzle -2 Back rinse nozzle -EBR 2-3 : DEV -LD Nozzle -2 Rinse nozzle 2-4 : DEV -LD Nozzle -2 Rinse nozzle IFB / Interface station block -Interface for NIKON Stepper TEMPERATURE AND HUMIDITY CONTROLLER -T&H-ESA-4-D-05 / SHINWHA 1 unit THERMO CONTROLLER -INR-244-265A-2400 / SMC 1 unit CHEMICAL SUPPLY CABINET -1 unit AC Power boxOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
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