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TEL / TOKYO ELECTRON ACT 12 SOD
  • TEL / TOKYO ELECTRON ACT 12 SOD
  • TEL / TOKYO ELECTRON ACT 12 SOD
  • TEL / TOKYO ELECTRON ACT 12 SOD
Description
No description
Configuration
No Configuration
OEM Model Description
The CLEAN TRACK™ ACT™ 12 SOD is spin-on dielectric systems designed to coat, bake, and cure of low-k dielectric materials. Its innovative process modules provides optimally process for organic, inorganic, hybrid, and porous materials. In addition, CLEAN TRACK™ ACT™ 12 SOD equipped in-line curing, which had been traditionally performed in a furnace, by incorporation of high temperature hotplate processing in a low-oxygen environment.
Documents

No documents

CATEGORY
Coaters & Developers

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

124336


Wafer Sizes:

12"/300mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

ACT 12 SOD

verified-listing-icon
Verified
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
listing-photo-54ada6205b554fbb9a5517c86bc542d1-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

124336


Wafer Sizes:

12"/300mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
No Configuration
OEM Model Description
The CLEAN TRACK™ ACT™ 12 SOD is spin-on dielectric systems designed to coat, bake, and cure of low-k dielectric materials. Its innovative process modules provides optimally process for organic, inorganic, hybrid, and porous materials. In addition, CLEAN TRACK™ ACT™ 12 SOD equipped in-line curing, which had been traditionally performed in a furnace, by incorporation of high temperature hotplate processing in a low-oxygen environment.
Documents

No documents