Skip to main content
Moov logo

Moov Icon
LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL SEQUEL
    Description
    NIT MIM
    Configuration
    No Configuration
    OEM Model Description
    The NOVELLUS CONCEPT TWO DUAL SEQUEL is a system that uses reactive ion-beam deposition to deposit thick films onto wafers. It has two process chambers that can provide the throughput power of twelve stations, resulting in dramatic improvements in productivity for these types of films. It is designed for high throughput deposition of thick films, such as layers before CMP (chemical-mechanical planarization), and dual layer passivation films. It also offers dual-beam operation for increased wafer-to-wafer uniformity and higher deposition rates, as well as process control capabilities and versatile materials handling for a wide range of applications.
    Documents

    No documents

    verified-listing-icon

    Verified

    CATEGORY
    CVD

    Last Verified: Over 30 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    128125


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL SEQUEL

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" DUAL SEQUEL

    CVD
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago
    PREFERRED
     
    SELLER
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL SEQUEL

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" DUAL SEQUEL

    CVD
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" DUAL SEQUEL

    verified-listing-icon
    Verified
    CATEGORY
    CVD
    Last Verified: Over 30 days ago
    listing-photo-53b5c413af94436d88ce5861a98026cc-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    128125


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    NIT MIM
    Configuration
    No Configuration
    OEM Model Description
    The NOVELLUS CONCEPT TWO DUAL SEQUEL is a system that uses reactive ion-beam deposition to deposit thick films onto wafers. It has two process chambers that can provide the throughput power of twelve stations, resulting in dramatic improvements in productivity for these types of films. It is designed for high throughput deposition of thick films, such as layers before CMP (chemical-mechanical planarization), and dual layer passivation films. It also offers dual-beam operation for increased wafer-to-wafer uniformity and higher deposition rates, as well as process control capabilities and versatile materials handling for a wide range of applications.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL SEQUEL

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" DUAL SEQUEL

    CVDVintage: 0Condition: UsedLast Verified:Over 30 days ago
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL SEQUEL

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" DUAL SEQUEL

    CVDVintage: 0Condition: UsedLast Verified:Over 30 days ago
    PREFERRED
     
    LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL SEQUEL

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" DUAL SEQUEL

    CVDVintage: 0Condition: UsedLast Verified:Over 60 days ago