LAM RESEARCH / NOVELLUS CONCEPT TWO "C2"

Description

No description

Configuration

W deposition with pulsed nucleation layer (PNL ) hardware and process capability Reactive Plasma Clean ( RPC) hardware. Chamber system that uses plasma NF3 rather than C2F6 Minimal Ovelap Exclusion Ring ( MOER)- keeps W from depositing on the edge of the wafer Installation & Training

OEM Model Description

The NOVELLUS CONCEPT TWO is a modular, integrated production system that is capable of depositing both dielectric and conductive metal layers by combining one or more processing chambers around a common, automated robotic wafer handler. It was introduced in November 1991.

Documents

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LAM RESEARCH / NOVELLUS

CONCEPT TWO "C2"

Verified

CVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Refurbished

Operational Status:

Unknown

Product ID:

69602

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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