
Description
M/PLEX Multiplex ICP EtcherConfiguration
Surface Technology Systems M/PLEX Multiplex ICP Etcher, 400V, 50Hz, 3ph, w/ MAG900CT turbopump. Includes power distribution & control rack cabinet, w/ power distribution, Electrogrip electrostatic driver, vAT PM-7 adaptive pressure controller, Leybold Mag Drive 1000 pump controller; ENI ACG-10B RF generator; ENI ACG-3B-06 RF generator; ENI VL-400 phase shift controller; PowerBright VC-2000 step-up/down transformer; BOC Edwards iQDP-80 roughing pump, code# A532-80-905; Neslab RTE-211 recirculating chiller, BOM# 135103200702; gas cabinet; LEP300 control server. Configured for 3in substrates.OEM Model Description
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.Documents
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Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
126234
Wafer Sizes:
3"/75mm
Vintage:
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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MULTIPLEX ICP
CATEGORY
Dry / Plasma Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
126234
Wafer Sizes:
3"/75mm
Vintage:
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
M/PLEX Multiplex ICP EtcherConfiguration
Surface Technology Systems M/PLEX Multiplex ICP Etcher, 400V, 50Hz, 3ph, w/ MAG900CT turbopump. Includes power distribution & control rack cabinet, w/ power distribution, Electrogrip electrostatic driver, vAT PM-7 adaptive pressure controller, Leybold Mag Drive 1000 pump controller; ENI ACG-10B RF generator; ENI ACG-3B-06 RF generator; ENI VL-400 phase shift controller; PowerBright VC-2000 step-up/down transformer; BOC Edwards iQDP-80 roughing pump, code# A532-80-905; Neslab RTE-211 recirculating chiller, BOM# 135103200702; gas cabinet; LEP300 control server. Configured for 3in substrates.OEM Model Description
The STS MULTIPLEX ICP is an etch system. The STS MULTIPLEX ICP can be used with 2” wafer sizes. It has a silicon material plate and ASE polymer system processer.Documents
No documents