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TEL / TOKYO ELECTRON UNITY ME
  • TEL / TOKYO ELECTRON UNITY ME
  • TEL / TOKYO ELECTRON UNITY ME
  • TEL / TOKYO ELECTRON UNITY ME
  • TEL / TOKYO ELECTRON UNITY ME
Description
Oxide
Configuration
3ch Oxide
OEM Model Description
UNITY™ Me is a cost effective dry etch system for 100/150/200mm wafer diameter, which has been attracting attention in recent years again as a highly efficient system and is still sold as a new product. There are rich variety of special chamber specifications, such as SCCM™, DRM for SiO2/SiN etch and UD chamber for Si/SiC trench etch. TEL offers a wide range of etch applications to the customer through closely collaboration in process demonstration using internal evaluation tools. Unity ME was originally made in Mass. But moved to Japan, supported 3 chambers and an ash or other small unit. Originally 200mm, some were converted to 300mm. TEL now manufactures this system again for 100-300mm.
Documents
CATEGORY
Dry / Plasma Etch

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

75364


Wafer Sizes:

8"/200mm


Vintage:

2001


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

TEL / TOKYO ELECTRON

UNITY ME

verified-listing-icon
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
listing-photo-f7a4a478f0724a988ba1f4c712ed590a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2094/f7a4a478f0724a988ba1f4c712ed590a/982f35b06dd74293a289348befcc91ef_08e57368156c413c9517fd778f59f1a445005c_mw.jpeg
listing-photo-f7a4a478f0724a988ba1f4c712ed590a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2094/f7a4a478f0724a988ba1f4c712ed590a/ee9920a50d4c4dc8926c6f92a1145e55_133ccbbf848a4f1d954a35d9e05e5afe45005c_mw.jpeg
listing-photo-f7a4a478f0724a988ba1f4c712ed590a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2094/f7a4a478f0724a988ba1f4c712ed590a/b7d3f80c94d845e8a5cf0f7e095fcd70_0f993270dd314072896d236d152181a845005c_mw.jpeg
listing-photo-f7a4a478f0724a988ba1f4c712ed590a-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2094/f7a4a478f0724a988ba1f4c712ed590a/6cde441c070b4a688985b2951b35b456_7d986dd3de8b4004a1770b4e7d86642445005c_mw.jpeg
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

75364


Wafer Sizes:

8"/200mm


Vintage:

2001


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Oxide
Configuration
3ch Oxide
OEM Model Description
UNITY™ Me is a cost effective dry etch system for 100/150/200mm wafer diameter, which has been attracting attention in recent years again as a highly efficient system and is still sold as a new product. There are rich variety of special chamber specifications, such as SCCM™, DRM for SiO2/SiN etch and UD chamber for Si/SiC trench etch. TEL offers a wide range of etch applications to the customer through closely collaboration in process demonstration using internal evaluation tools. Unity ME was originally made in Mass. But moved to Japan, supported 3 chambers and an ash or other small unit. Originally 200mm, some were converted to 300mm. TEL now manufactures this system again for 100-300mm.
Documents