Description
No descriptionConfiguration
Centura 5200 TCPP - Single Chamber Radiance Plus Included: Electro Polished Nickel Frame & Modules 2ea ENP Centura Loadlocks for 200mm Wafers Wafer Transfer Chamber with HP Robot High Temperature Quartz End Effector On the Fly Wafer Centering 2ea TanOx Chambers - Positions C & D 2ea ENP Fast Cooldown Chambers V452 Main Control Board Gas Panel with 2ea Gas Pallets Interconnect Cables AC Distribution Rack – 160A Through the Wall Installation KitOEM Model Description
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPDocuments
No documents
CATEGORY
Epitaxial deposition (EPI)
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
73468
Wafer Sizes:
Unknown
Vintage:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
CATEGORY
Epitaxial deposition (EPI)
Last Verified: 11 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
73468
Wafer Sizes:
Unknown
Vintage:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Centura 5200 TCPP - Single Chamber Radiance Plus Included: Electro Polished Nickel Frame & Modules 2ea ENP Centura Loadlocks for 200mm Wafers Wafer Transfer Chamber with HP Robot High Temperature Quartz End Effector On the Fly Wafer Centering 2ea TanOx Chambers - Positions C & D 2ea ENP Fast Cooldown Chambers V452 Main Control Board Gas Panel with 2ea Gas Pallets Interconnect Cables AC Distribution Rack – 160A Through the Wall Installation KitOEM Model Description
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPDocuments
No documents