Description
Horizontal furnaces, GIGA TECH cleaning machines, and BAKE are excluded.Configuration
No ConfigurationOEM Model Description
The SEN CORPORATION / SUMITOMO NV-GSD III-180 is a high-current ion implanter that supports 5, 6, and 8-inch wafers. It has a wide range of implantation energy, from 2 to 180 keV, and is equipped with a post-deflection acceleration mechanism. It has a reliable batch transfer system, high throughput, and accurate high-dose control. The beam quality is high with low metal contamination and cross-contamination. It is also highly reliable and maintainable.- High-Current Ion Implanter - Supports for 5, 6, and 8-inch wafers - Supports for a wide range of implantation energy, from 2 to 180 keV (equipped with a post-deflection acceleration mechanism) - Reliable batch transfer system - Highly effective throughput - Reliable high-dose control accuracy - High beam quality with low metal contamination and low cross-contamination - High reliability, high maintainabilityDocuments
No documents
CATEGORY
High Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
124715
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEN CORPORATION / SUMITOMO
NV GSD III 180
CATEGORY
High Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
124715
Wafer Sizes:
6"/150mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Horizontal furnaces, GIGA TECH cleaning machines, and BAKE are excluded.Configuration
No ConfigurationOEM Model Description
The SEN CORPORATION / SUMITOMO NV-GSD III-180 is a high-current ion implanter that supports 5, 6, and 8-inch wafers. It has a wide range of implantation energy, from 2 to 180 keV, and is equipped with a post-deflection acceleration mechanism. It has a reliable batch transfer system, high throughput, and accurate high-dose control. The beam quality is high with low metal contamination and cross-contamination. It is also highly reliable and maintainable.- High-Current Ion Implanter - Supports for 5, 6, and 8-inch wafers - Supports for a wide range of implantation energy, from 2 to 180 keV (equipped with a post-deflection acceleration mechanism) - Reliable batch transfer system - Highly effective throughput - Reliable high-dose control accuracy - High beam quality with low metal contamination and low cross-contamination - High reliability, high maintainabilityDocuments
No documents