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KLA 5200
    Description
    Overlay Measurement System
    Configuration
    No Configuration
    OEM Model Description
    The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.
    Documents

    No documents

    verified-listing-icon

    Verified

    CATEGORY
    Overlay

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    119865


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    KLA 5200

    KLA

    5200

    Overlay
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    KLA

    5200

    verified-listing-icon
    Verified
    CATEGORY
    Overlay
    Last Verified: Over 60 days ago
    listing-photo-732b02439b7a4049946cf5a2847130f0-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    119865


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Overlay Measurement System
    Configuration
    No Configuration
    OEM Model Description
    The KLA 5200 is an overlay metrology system that helps chipmakers improve process control and reduce time to market for advanced products with feature sizes down to .18 µm. It uses Coherence Probe Microscopy (CPM) to identify surfaces and can measure all layers, including low-contrast or grainy targets. The KLA 5200 can lower stepper cost-of-ownership by providing high-quality data to prevent lithography process errors, helping manage the overlay budget and maximizing lithography output.
    Documents

    No documents

    Similar Listings
    View All
    KLA 5200

    KLA

    5200

    OverlayVintage: 0Condition: UsedLast Verified:Over 30 days ago
    KLA 5200

    KLA

    5200

    OverlayVintage: 0Condition: UsedLast Verified:Over 30 days ago
    KLA 5200

    KLA

    5200

    OverlayVintage: 0Condition: UsedLast Verified:Over 60 days ago