Description
This Nikon 2nd Relay Rear Optic Lens is used working surplus. The physical condition is good, with no signs of previous use and handling. Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System. No scratches, dents or stripped threading.. Email or text for more pictures.Configuration
Part No: 2nd Relay Rear Optic Lens 4K801-189 Non-Copper Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System Made in JapanOEM Model Description
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.Documents
No documents
Key Item Details
Condition:
Refurbished
Operational Status:
Deinstalled
Product ID:
120257
Wafer Sizes:
2"/50mm
HDD / Software:
Yes
HDD / Software:
Yes
Process Node:
1
Exposure:
1
Lens Data:
1
Vintage:
1
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-S204B
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Deinstalled
Product ID:
120257
Wafer Sizes:
2"/50mm
HDD / Software:
Yes
HDD / Software:
Yes
Process Node:
1
Exposure:
1
Lens Data:
1
Vintage:
1
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
This Nikon 2nd Relay Rear Optic Lens is used working surplus. The physical condition is good, with no signs of previous use and handling. Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System. No scratches, dents or stripped threading.. Email or text for more pictures.Configuration
Part No: 2nd Relay Rear Optic Lens 4K801-189 Non-Copper Removed from a Nikon NSR-S204B Step-and-Repeat Scanning System Made in JapanOEM Model Description
The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.Documents
No documents