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Description
i-Line Wide-Field StepperConfiguration
Tool is operating in clean room. Labelled as Collateral Asset. Pictures: Please see. Configurations will be provided. Additional performance data will be collected. Missing or damaged parts: Not reported.OEM Model Description
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.Documents
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Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
11980
Wafer Sizes:
12"/300mm
Vintage:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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NIKON
NSR-SF130
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
11980
Wafer Sizes:
12"/300mm
Vintage:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
i-Line Wide-Field StepperConfiguration
Tool is operating in clean room. Labelled as Collateral Asset. Pictures: Please see. Configurations will be provided. Additional performance data will be collected. Missing or damaged parts: Not reported.OEM Model Description
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.Documents
No documents