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APPLIED MATERIALS (AMAT) P5000 CVD
    Description
    4 Nitride DLH
    Configuration
    4C/H
    OEM Model Description
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    verified-listing-icon

    Verified

    CATEGORY
    CVD

    Last Verified: 17 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    76118


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD
    Vintage: 0Condition: Used
    Last Verified11 days ago

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    Verified
    CATEGORY
    CVD
    Last Verified: 17 days ago
    listing-photo-9e2f387748ef4e32839e88326baa8991-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2205/9e2f387748ef4e32839e88326baa8991/5c1c0b98a765457c90a9b157ddd24883_1_mw.jpg
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    76118


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    4 Nitride DLH
    Configuration
    4C/H
    OEM Model Description
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    Documents

    No documents

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    View All
    APPLIED MATERIALS (AMAT) P5000 CVD

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    APPLIED MATERIALS (AMAT) P5000 CVD

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